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Stepper

Stepper

Stepper with a deep depth of focus is useful for large step-structure devices ⁄ thick resist films.

Features

Thick resist films and exposure with a deep depth of focus

  • Depth of focus of 100 to 500um

Resolving power: 0.5-10um

  • NA-variable mechanism and combination of 3 types of lenses enable to widen the resolving power.

Specifications

Types Lithography
Objected product for all
Correspondent wafer ⁄ work 50-300mm
Correspondent work thickness SEMI Standards for wafers

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